Precursors & materials
ADEKA
Semiconductor materials
Semiconductor materials including high-k and metal precursor chemistry for thin-film deposition.
Official profile & sourceTHE ALD COMMUNITY
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Research groups, ALD equipment, precursors and tools for simulation and thin-film characterization. Find a useful starting point, then explore each organization’s own work.
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21 research groups · 17 companies
A–Z uses the lead researcher’s surname for groups and the company name for businesses. Search works in English and Chinese.
Precursors & materials
Air Liquide Electronics
Electronic gases & advanced materials
Specialty gases and advanced materials for semiconductor processes, including deposition precursor solutions.
Official profile & source
ALD equipment
Arradiance
ALD & MLD systems
ALD and molecular layer deposition systems, with coating services for research and development.
Official profile & source
ALD equipment
ASM
Semiconductor deposition
Thermal and plasma-enhanced ALD equipment and process platforms for semiconductor manufacturing.
Official profile & source
Research groups
Chemistry of Thin Film Materials · Bachmann
Friedrich-Alexander University Erlangen-Nürnberg · Germany
ALD and electrochemical routes to structured thin films for energy conversion and storage.
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Research groups
The Barry Lab
Carleton University · Canada
Ligand and precursor design for ALD, with mechanistic studies of gas-phase and surface reactivity.
Official profile & source
ALD equipment
Beneq
ALD systems & coating services
ALD systems for research and industrial applications, alongside thin-film coating services.
Official profile & source
Research groups
Bent Research Group
Stanford University · USA
Surface chemistry and ALD mechanisms, area-selective deposition, and thin-film materials for electronics and energy.
Official profile & source
Metrology & characterization
Bruker
Materials characterization
X-ray and atomic force microscopy tools for structure, surfaces and thin-film characterization.
Official profile & source
Research groups
Rong Chen · Micro/Nano Materials Design & Manufacturing
Huazhong University of Science and Technology · China
Atomic-scale manufacturing centered on ALD: surface reactions, process development, equipment and applications in electronics, energy and catalysis.
Official profile & source
Simulation
COMSOL
Multiphysics modeling
Multiphysics simulation software for transport, fluid flow and chemical-reaction modeling.
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Simulation
Dassault Systèmes · BIOVIA
Materials Studio
Materials Studio supports atomistic modeling of materials using quantum, classical and mesoscale methods.
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Research groups
CoCooN · Detavernier & Dendooven
Ghent University · Belgium
Conformal coatings of nanomaterials, with ALD growth, in situ characterization and applications in complex structures.
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Research groups
Materials Chemistry · Anjana Devi
IFW Dresden / TU Dresden · Germany
Precursor chemistry and ALD/MOCVD processes for functional nanostructured materials in electronics and energy applications.
Official profile & source
Precursors & materials
Entegris
Electronic materials & delivery
Electronic materials, precursor delivery and contamination-control products for semiconductor manufacturing.
Official profile & source
ALD equipment
Forge Nano
Particle & wafer ALD
ALD equipment and surface-engineering technologies for particles and wafers.
Official profile & source
Research groups
Steven M. George Research Group
University of Colorado Boulder · USA
Surface chemistry and nanoscale engineering through ALD, atomic layer etching and molecular layer deposition.
Official profile & source
Metrology & characterization
HORIBA
Scientific instrumentation
Ellipsometry, Raman spectroscopy and related instruments for materials and thin-film analysis.
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Metrology & characterization
J.A. Woollam
Spectroscopic ellipsometry
Spectroscopic ellipsometers for thin-film thickness and optical-property characterization.
Official profile & source
Research groups
Functional Materials · Maarit Karppinen
Aalto University · Finland
ALD and molecular layer deposition for functional inorganic and inorganic–organic thin-film materials.
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Research groups
Plasma & Materials Processing · Erwin Kessels
Eindhoven University of Technology · Netherlands
Plasma-assisted ALD and atomic-scale processing, connecting plasma and surface science with functional thin films.
Official profile & source
Research groups
Nanomaterials · Mato Knez
CIC nanoGUNE · Spain
Thin-film coating and material functionalization, including ALD and inorganic–organic hybrid nanomaterials.
Official profile & source
ALD equipment
Kurt J. Lesker Company
Vacuum & deposition systems
Vacuum components, deposition systems and ALD technology for thin-film research.
Official profile & source
ALD equipment
Lam Research
Semiconductor wafer fabrication
Semiconductor process equipment spanning deposition, etch and atomic-scale processing.
Official profile & source
Research groups
Selective Atomic-Scale Processing · Adrie Mackus
Eindhoven University of Technology · Netherlands
Area-selective ALD and atomic-scale processing for nanoelectronics, with emphasis on reaction mechanisms and selectivity.
Official profile & source
Research groups
Thin-Film Chemistry · Ola Nilsen
University of Oslo · Norway
ALD chemistry and functional thin-film materials, including oxides and hybrid materials.
Official profile & source
ALD equipment
Oxford Instruments
Plasma Technology
Plasma-enhanced ALD systems and thin-film processing tools for research and device manufacturing.
Official profile & source
Research groups
Parsons Research Group
North Carolina State University · USA
ALD thin-film growth and area-selective deposition for semiconductor materials and nanoscale processing.
Official profile & source
Research groups
Pedersen Group
Linköping University · Sweden
Chemistry of vapor deposition, including ALD and CVD routes for thin-film materials and conformal growth.
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Research groups
Pinna Research Group
Humboldt University of Berlin · Germany
Functional nanostructures and thin-film materials, including ALD synthesis and coatings.
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Research groups
Aalto Catalysis · Riikka Puurunen
Aalto University · Finland
Catalysis and ALD surface chemistry, including conformality, porous materials and diffusion–reaction modeling.
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Research groups
HelsinkiALD · Ritala & Putkonen
University of Helsinki · Finland
Led by Mikko Ritala and Matti Putkonen, the group develops ALD chemistries, thin-film materials and reaction-mechanism studies.
Official profile & source
ALD equipment
SENTECH Instruments
Deposition & thin-film measurement
ALD and plasma processing systems, plus ellipsometry for thin-film characterization.
Official profile & source
ALD equipment
Tokyo Electron
Semiconductor process equipment
Semiconductor deposition platforms including ALD within its thin-film process portfolio.
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Research groups
Van Ommen Group
Delft University of Technology · Netherlands
Particle technology and ALD on powders, connecting nanoscale coatings with scalable particle processing.
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Research groups
Weimer Research Group
University of Colorado Boulder · USA
Particle ALD and functional coatings for energy, catalysis and materials processing.
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Research groups
Winter Research Group
Wayne State University · USA
Inorganic precursor chemistry and ALD processes for metal and metal-containing thin films.
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Research groups
Zaera Research Group
University of California, Riverside · USA
Surface reactions relevant to ALD and catalysis, using molecular-level studies of thin-film growth and interfaces.
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